The SPIE-BACUS Scholarship recognizes outstanding contributions to the photomask industry that have at least one of the following attributes: a fundamental change or innovation, an enduring contribution, and/or an enabling contribution. The scholarship is awarded to a student in the field of microlithography with an emphasis on photomask technology and/or optical or EUV photolithography technologies. Applicants who have received a terminal degree (MD, JD, PhD, etc.) are not eligible to apply. Applicants must be a student member of SPIE. Two recommendations are required. Family members, relatives and students are not eligible to submit a recommendation. Please visit the scholarship's website or contact SPIE for more information.